Nanoporous Ti[O.sub.2] and W[O.sub.3] films by anodization of titanium and tungsten substrates: Influence of process variables on morphology and photoelectrochemical response
Article Abstract:
The influence of anodization conditions and substrate surface history on the photoelectrochemical response of the resultant Ti[O.sub.2] and W[O.sub.3] semiconductor surfaces is investigated. The self-organized nanopore morphology has yielded an excellent quality of photoelectrochemical response by using the photooxidation of water and organic species as reaction probes.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2006
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Imaging of atomic layer deposited (ALD) tungsten monolayers on alpha-Ti[O.sub.2](110) by X-ray standing wave fourier inversion
Article Abstract:
A single atomic layer of tungsten group by atomic layer deposition (ALD) on a single-crystal rutile Ti[O.sub.2] (110) support is studied by the X-ray standing wave (XSW) technique. XSW measurements clearly show that ALD conformal layers could be highly coherent with respect to the substrate lattice.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2006
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Photoelectrochemical properties of nanostructured tungsten trioxide films
Article Abstract:
The photoelectrochemical characteristics of highly transparent nanoporous WO3 films are presented. Experiments conducted under simulated solar AM 1.5 illumination resulted in steady-state anodic photocurrents of the order of several mA/cm(super 2).
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2001
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